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Amidst Semiconductor Metrology Segment Reshuffle, Tevet Creates Niche as Throughput and Cost Leader
AMIDST SEMICONDUCTOR METROLOGY SEGMENT RESHUFFLE, TEVET CREATES NICHE AS THROUGHPUT AND COST LEADER
Multiple design-in wins and tool-of-record selections establish new segment leadership in integrated metrology for semiconductor fab equipment
Yoknea’m, Israel, February 8, 2007
In the past, integrating metrology on process tools and in fab automation equipment was largely impractical because of the high cost, low reliability, and low throughput of available integrated metrology solutions. In 2005, with the market introduction of the Trajectory
—With record 2006 sales and a continuing momentum of design wins in January, Tevet Process Control Technologies has positioned itself as a leader in the highly competitive semiconductor metrology market. During a year marked by intensive metrology mergers, technology rationalizations, and product line cancellations, Tevet won validation of its industry-leading Integrated Metrology Module (IMM) by delivering high throughput with low capital and running costs to develop an entirely new parallel sensor metrology niche.™ T3 film thickness integrated metrology module (IMM), Tevet inaugurated a new segment within the fast growing semiconductor process control and metrology sector.
Key Design Wins, January Records and Milestones
Tevet secured key design-win milestones that mark its emergence as a growth leader in semiconductor integrated metrology. In January 2007, Tevet gained records in the number of integrations, IMM adoption per tool, IMM adoption per fab site, and IMM tool-of-record selection. Other milestones reached include:
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• 3 new tool-of-record selections at multi-site, multinational IC manufacturers in Q4 2006
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4X growth in Tevet CVD IM installed base, 2005 to 2006
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Tevet’s unique solid-state, parallel sensor design and proprietary
“The strong growth at Tevet over the last two years validated the need for Tevet’s parallel sensor, in-die measurement approach,” said Yuval Wasserman, CEO of Tevet Process Control Technologies. “Tevet’s Trajectory T
Record backlog: exited 2006 with approximately 30% of 2007 projected revenue already bookedIsTMS software enables single shot per wafer measurement for industry leading throughput (>250 wph) at lowest capital and running costs. Plasma deposition, spin-on processes, and other high throughput steps can now integrate the critically needed process control and excursion detection solutions with no throughput or reliability degradation.3 has been instrumental in monitoring and controlling production-cost sensitive process steps in leading IC fabs with unmatched ROI. As 2007 begins, we see fabs aggressively running higher throughput tools and processes that, in turn, require Tevet’s integrated metrology to keep up with their fastest processes while providing every-wafer measurement and detection. We are pleased with the customer response as made evident by our recent milestones and expect our growth rate to continue at above the triple digit percentage growth we’ve seen since Tevet’s introduction of the parallel sensor IMM process control solution.”
About Tevet-PCT:
Tevet Process Control Technologies serves the semiconductor industry with unique integrated metrology solutions for critical process control challenges. Supporting customers worldwide, Tevet develops its technology and products in its headquarters in Israel and provides sales, marketing and technical support through its US offices. More information is available at www.tevet-pct.com.
10 design-in wins with leading IC process equipment manufacturers and Fab automation systems |
